Substrate is developing a vertically integrated semiconductor foundry built around its advanced X-ray lithography technology. The company says its approach uses particle accelerators to generate bright beams for patterning silicon wafers, and that it has designed a production-quality 300 mm wafer lithography tool. Substrate also describes using computational simulations to model lithography and validate patterns through printing. Its stated aim is to extend Moore’s Law while reducing the cost and complexity of leading-edge fabrication.